Researchers at Johns Hopkins University have unveiled a new approach to chipmaking that uses lasers with a 6.5nm ~ 6.7nm wavelength — also known as Soft X-rays — that could increase the resolution of lithography tools to 5nm and below, reports data-analytics-id=”inline-link” href=”https://cosmosmagazine.com/science/engineering/microchip-beyond-extreme-uv/” target=”_blank” data-url=”https://cosmosmagazine.com/science/engineering/microchip-beyond-extreme-uv/” referrerpolicy=”no-referrer-when-downgrade” data-hl-processed=”none”>Cosmos, citing a paper published in data-analytics-id=”inline-link” href=”https://go.redirectingat.com/?id=92X1584492&xcust=tomshardware_us_2964107056231611113&xs=1&url=https%3A%2F%2Fwww.nature.com%2Farticles%2Fs44286-025-00273-z&sref=https%3A%2F%2Fwww.tomshardware.com%2Ftech-industry%2Fsemiconductors%2Fbeyond-euv-chipmaking-tech-pushes-soft-x-ray-lithography-closer-to-challenging-hyper-na-euv-b-euv-uses-new-resist-chemistry-to-make-smaller-chips” target=”_blank” data-url=”https://www.nature.com/articles/s44286-025-00273-z” referrerpolicy=”no-referrer-when-downgrade” rel=”sponsored noopener” data-hl-processed=”skimlinks” data-placeholder-url=”https://go.redirectingat.com/?id=92X1584492&xcust=hawk-custom-tracking&xs=1&url=https%3A%2F%2Fwww.nature.com%2Farticles%2Fs44286-025-00273-z&sref=https%3A%2F%2Fwww.tomshardware.com%2Ftech-industry%2Fsemiconductors%2Fbeyond-euv-chipmaking-tech-pushes-soft-x-ray-lithography-closer-to-challenging-hyper-na-euv-b-euv-uses-new-resist-chemistry-to-make-smaller-chips” data-google-interstitial=”false” data-merchant-name=”nature.com” data-merchant-network=”SkimLinks”>Nature.
The scientists call their method ‘beyond-EUV’ — suggesting that their technology could replace industry-standard EUV lithography — but the researchers admit they are currently years away from building even…
