Japan’s Dai Nippon Printing (DNP) claims to have developed a nanoimprint lithography template capable of data-analytics-id=”inline-link” href=”https://www.global.dnp/news/detail/20177718_4126.html” target=”_blank” data-url=”https://www.global.dnp/news/detail/20177718_4126.html” referrerpolicy=”no-referrer-when-downgrade” data-hl-processed=”none” data-mrf-recirculation=”inline-link”>patterning logic with a feature size of 1.4nm, with plans for mass production in 2027. Canon, which has spent years pursuing nanoimprint lithography as a lower-power alternative to EUV, is already shipping its first 300mm tools to early research partners.
Together, the companies are pointing to imprinting as a way to cut lithography power consumption by up to 90% for advanced nodes. With TSMC and…
