A secret laboratory in China has quietly assembled a prototype extreme ultraviolet (EUV) lithography system and is now testing it stealthily, which means that the country may be close to replicating the most advanced technology that currently exists on Earth, reports data-analytics-id=”inline-link” href=”https://www.reuters.com/world/china/how-china-built-its-manhattan-project-rival-west-ai-chips-2025-12-17/” data-url=”https://www.reuters.com/world/china/how-china-built-its-manhattan-project-rival-west-ai-chips-2025-12-17/” target=”_blank” referrerpolicy=”no-referrer-when-downgrade” data-hl-processed=”none” data-mrf-recirculation=”inline-link”>Reuters.
The tool was reportedly developed by reverse engineering existing scanners from ASML and is said to be on-track to make prototype chips in 2028. If the information is correct, then Chinese scientists have made data-analytics-id=”inline-link” href=”https://www.tomshardware.com/tech-industry/semiconductors/china-injects-tens-of-billions-of-dollars-in-chipmaking-tools-but-its-easily-more-than-a-decade-behind-the-market-leaders-heres-why” data-mrf-recirculation=”inline-link” data-before-rewrite-localise=”https://www.tomshardware.com/tech-industry/semiconductors/china-injects-tens-of-billions-of-dollars-in-chipmaking-tools-but-its-easily-more-than-a-decade-behind-the-market-leaders-heres-why”>numerous…
