New 1.4nm nanoimprint lithography template could reduce the need for EUV steps in advanced process nodes — questions linger as no foundry has yet committed to nanoimprint lithography for high-volume manufacturing

December 17, 2025

, By Tom’s Hardware

New 1.4nm nanoimprint lithography template could reduce the need for EUV steps in advanced process nodes — questions linger as no foundry has yet committed to nanoimprint lithography for high-volume manufacturing

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Japan’s Dai Nippon Printing (DNP) claims to have developed a nanoimprint lithography template capable of data-analytics-id=”inline-link” href=”https://www.global.dnp/news/detail/20177718_4126.html” target=”_blank” data-url=”https://www.global.dnp/news/detail/20177718_4126.html” referrerpolicy=”no-referrer-when-downgrade” data-hl-processed=”none” data-mrf-recirculation=”inline-link”>patterning logic with a feature size of 1.4nm, with plans for mass production in 2027. Canon, which has spent years pursuing nanoimprint lithography as a lower-power alternative to EUV, is already shipping its first 300mm tools to early research partners.

Together, the companies are pointing to imprinting as a way to cut lithography power consumption by up to 90% for advanced nodes. With TSMC and…

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New 1.4nm nanoimprint lithography template could reduce the need for EUV steps in advanced process nodes — questions linger as no foundry has yet committed to nanoimprint lithography for high-volume manufacturing

December 17, 2025

, Published By Tom’s Hardware

New 1.4nm nanoimprint lithography template could reduce the need for EUV steps in advanced process nodes — questions linger as no foundry has yet committed to nanoimprint lithography for high-volume manufacturing

Japan’s Dai Nippon Printing (DNP) claims to have developed a nanoimprint lithography template capable of data-analytics-id=”inline-link” href=”https://www.global.dnp/news/detail/20177718_4126.html” target=”_blank” data-url=”https://www.global.dnp/news/detail/20177718_4126.html” referrerpolicy=”no-referrer-when-downgrade” data-hl-processed=”none” data-mrf-recirculation=”inline-link”>patterning logic with a feature size of 1.4nm, with plans for mass production in 2027. Canon, which has spent years pursuing nanoimprint lithography as a lower-power alternative to EUV, is already shipping its first 300mm tools to early research partners.

Together, the companies are pointing to imprinting as a way to cut lithography power consumption by up to 90% for advanced nodes. With TSMC and…

Disclaimer

We strive to uphold the highest ethical standards in all of our reporting and coverage. We StartupNews.fyi want to be transparent with our readers about any potential conflicts of interest that may arise in our work. It’s possible that some of the investors we feature may have connections to other businesses, including competitors or companies we write about. However, we want to assure our readers that this will not have any impact on the integrity or impartiality of our reporting. We are committed to delivering accurate, unbiased news and information to our audience, and we will continue to uphold our ethics and principles in all of our work. Thank you for your trust and support.

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You can finally cast your favorite Apple TV shows on Android — here’s how

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