IBM and Lam Research have announced a five-year collaboration to develop the materials and fabrication processes needed to scale logic chips beyond 1nm using High NA EUV lithography and Lam’s Aether dry resist technology. The work will take place at IBM Research’s facilities at the NY Creates Albany NanoTech Complex in Albany, New York.
The two companies have worked together for more than a decade, contributing to 7nm process development, nanosheet transistor architecture, and early EUV process…

![[CITYPNG.COM]White Google Play PlayStore Logo – 1500×1500](https://startupnews.fyi/wp-content/uploads/2025/08/CITYPNG.COMWhite-Google-Play-PlayStore-Logo-1500x1500-1-630x630.png)